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Fundamentals of Thin Film Technology

NQR Code:NG-4.5-EH-03731-2025-V1-NIELIT

  • Old Code: NG-4.5-EH-03731-2025-V1-NIELIT

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About this Qualification

Job Description

This Standalone NOS provides foundational knowledge and practical skills in semiconductor manufacturing. The course provides a comprehensive introduction to thin film deposition techniques, including Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), and Atomic Layer Deposition (ALD), covering thin film growth, characterization methods, and real-world applications. Students will gain proficiency in deposition equipment, characterization tools, and process integration, preparing them for roles in electronics, optics, and semiconductor industries.

Eligibility Criteria

Criteria 1 Criteria 2 Experience Training Qualification
10th Passed 1.5 Years 2 year NTC
3rd Year of 3 Year Diploma after 10th In relevant field No Experience None
UG 1st year In relevant field No Experience None
12th Passed 1.5 Years None
3 year Diploma after 10th In relevant field No Experience None

Progression Pathway

  • MEMS Backend Fabrication Engineer -> Semiconductor Fabrication Engineer

Learning Module In Job Role/Qualifcation

National Occupation Standards (NOS)/Module NOS Code Mandatory/ Optional Estimated size (Hours) Nos Credit Level
Fundamentals of Thin Film Technology NIE/ELE/N3305 Mandatory 30 1 4.5